Materials Research Meeting 2021

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Poster Session

D. Frontiers of Advanced Electronic Materials » [D-2] Frontier in Functional Oxides and Related Materials: from Materials Design to Device Applications

[D2-PR14] Slot 14

Tue. Dec 14, 2021 4:00 PM - 6:00 PM D2-PR14 (G403-404)

4:00 PM - 6:00 PM

[D2-PR14-32] Amorphous WO3 Electrochromic Films with controlled high-rate deposition by Reactive-gas-flow sputter deposition

*Nobuto Oka1,2, Masahiro Watanabe2, Junjun Jia2,3, Yuzo Shigesato2 (1. Kindai Univ. (Japan), 2. Aoyama Gakuin Univ. (Japan), 3. Waseda Univ. (Japan))

Keywords:electrochromic films, amorphous WO3, high-rate deposition, sputtering

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