Amorphous WO<sub>3</sub> Electrochromic Films with controlled high-rate deposition by Reactive-gas-flow sputter deposition

Nobuto Oka

Presentation information

Poster Session

D. Frontiers of Advanced Electronic Materials » [D-2] Frontier in Functional Oxides and Related Materials: from Materials Design to Device Applications

[D2-PV22] Slot 22

Tue. Dec 14, 2021 2:00 PM - 3:30 PM D2-PV22 (online)

2:00 PM - 3:30 PM

[D2-PV22-32] Amorphous WO₃ Electrochromic Films with controlled high-rate deposition by Reactive-gas-flow sputter deposition

*Nobuto Oka^1,2, Masahiro Watanabe², Junjun Jia^2,3, Yuzo Shigesato² (1. Kindai Univ. (Japan), 2. Aoyama Gakuin Univ. (Japan), 3. Waseda Univ. (Japan))

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Presentation information

[D2-PV22] Slot 22

[D2-PV22-32] Amorphous WO3 Electrochromic Films with controlled high-rate deposition by Reactive-gas-flow sputter deposition

[D2-PV22-32] Amorphous WO₃ Electrochromic Films with controlled high-rate deposition by Reactive-gas-flow sputter deposition