[D4-O4] Slot 04

[D4-O4-01] Wettability study of electrodeposited Cu₂O thin films in correlation with XPS analysis

*MDPA Shakya¹, KMDC Jayathilaka¹, WTMAPK Wanninayake¹, RP Wijesundara¹, Rosantha Kumara², Okkyun Seo², Osami Sakata² (1. Department of Physics and Electronics, University of Kelaniya (Sri Lanka), 2. Japan Synchrotron Radiation Research Institute (JASRI), Kouto 1-1-1, Sayo, Hyogo 679-5198 (Japan))

キーワード：Wettability, Contact angle, Cuprous Oxide, HAXPES, Electrodeposition