Thickness Dependence of Electronic and Crystal Structures in VO<sub>2</sub> Ultrathin Films

Daisuke Shiga

Presentation information

Oral Session

D. Frontiers of Advanced Electronic Materials » [D-5] Properties and Characterizations of Functional Surfaces and Interfaces

[D5-O6] Slot 06

Wed. Dec 15, 2021 9:00 AM - 11:00 AM Room P (G317)

Chair: Shigenori Ueda (National Institute for Materials Science), Koji Horiba (Institute of Materials Structure Science, High Energy Accelerator Research Organization)

10:00 AM - 10:15 AM

[D5-O6-04] Thickness Dependence of Electronic and Crystal Structures in VO₂ Ultrathin Films

*Daisuke Shiga^1,2, Billy Eric Yang¹, Naoto Hasegawa¹, Tatsuhiko Kanda¹, Ryosuke Tokunaga¹, Kohei Yoshimatsu^1,3, Ryu Yukawa², Miho Kitamura², Koji Horiba², Hiroshi Kumigashira^1,2,3 (1. Tohoku Univ. (Japan), 2. High Energy Accel. Res. Organ. (Japan), 3. Tokyo Inst. Tech. (Japan))

Keywords:Mott insulators, Peierls transition, Photoemission spectroscopy

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Presentation information

[D5-O6] Slot 06

[D5-O6-04] Thickness Dependence of Electronic and Crystal Structures in VO2 Ultrathin Films

[D5-O6-04] Thickness Dependence of Electronic and Crystal Structures in VO₂ Ultrathin Films