[F3-PR15] Slot 15

[F3-PR15-11] Application of Flash Lamp Annealing (FLA) Method on Heat Treatment Cu Thin Film and Low Dielectric Resin Films

*Hyumin Oh^1,2, Jong-Young Park^2,3, Hideo Honma^1,2, Kyu Han Kim⁴, Joo-Hyong Noh^1,2 (1. Graduate School of Eng., Kanto Gakuin Univ. (Japan), 2. Materials and Surface Eng. Res. Inst., Kanto Gakuin Univ. (Japan), 3. Daeduck Electronics Co., Ltd. (Korea), 4. Catholic Kwandong Univ. (Korea))

キーワード：Flash Lamp Annealing, Low Dielectric Resin Film, Cu Thin Metal Film, Annealing, Sensor