[F3-PV21] Slot 21

[F3-PV21-10] Expansion of diamond film formation area by using in-liquid microwave plasma CVD

*Yusuke Tominaga^1,2, Akihiro Uchida^1,2, Hiroshi Uetsuka³, Norihiro Suzuki², Naoya Ishida², Takeshi Kondo^1,2, Makoto Yuasa^1,2, Akira Fujishima², Chiaki Terashima^1,2 (1. Faculty of Science and Technology, Tokyo Univ. of Science (Japan), 2. Research Center for Space System Innovation (Japan), 3. Asahi Diamond Industrial Co., Ltd. (Japan))