[F3-PV21] Slot 21

[F3-PV21-11] Application of Flash Lamp Annealing (FLA) Method on Heat Treatment Cu Thin Film and Low Dielectric Resin Films

*Hyumin Oh^1,2, Jong-Young Park^2,3, Hideo Honma^1,2, Kyu Han Kim⁴, Joo-Hyong Noh^1,2 (1. Graduate School of Eng., Kanto Gakuin Univ. (Japan), 2. Materials and Surface Eng. Res. Inst., Kanto Gakuin Univ. (Japan), 3. Daeduck Electronics Co., Ltd. (Korea), 4. Catholic Kwandong Univ. (Korea))