Rapid and Low-Temperature Processing for Deposition of (K,Na)NbO<sub>3</sub> Thick Films Using Microwave-Assisted Hydrothermal Reaction

Hiroshi Uchida

Presentation information

Oral Session

H. Innovative Materials Processing for Sustainable Society » [H-1] Smart Processing

[H1-O7] Slot 07

Wed. Dec 15, 2021 2:30 PM - 6:00 PM Room L (G311)

Chair: Naoki Wakiya (Shizuoka University), Yuta Katayanagi (Gunma University)

4:40 PM - 5:00 PM

[H1-O7-04] Rapid and Low-Temperature Processing for Deposition of (K,Na)NbO₃ Thick Films Using Microwave-Assisted Hydrothermal Reaction

*Hiroshi Uchida¹, Masaki Okura¹, Yoshiharu Ito², Takahisa Shiraishi³, Takanori Kiguchi⁴, Toyohiko J Konno⁴, Hiroshi Funakubo³ (1. Sophia Univ. (Japan), 2. Nihon Univ. (Japan), 3. Tokyo Tech. (Japan), 4. Tohoku Univ. (Japan))

Keywords:Potassium niobite, Thick film, Hydrothermal deposition, Microwave heating, Low-temperature processing

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Presentation information

[H1-O7] Slot 07

[H1-O7-04] Rapid and Low-Temperature Processing for Deposition of (K,Na)NbO3 Thick Films Using Microwave-Assisted Hydrothermal Reaction

[H1-O7-04] Rapid and Low-Temperature Processing for Deposition of (K,Na)NbO₃ Thick Films Using Microwave-Assisted Hydrothermal Reaction