Materials Research Meeting 2021

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Oral Session

H. Innovative Materials Processing for Sustainable Society » [H-2] Plasma-Based Synthesis, Processing and Characterization of Materials for Energy and Environment

[H2-O8] Slot 08

Thu. Dec 16, 2021 9:00 AM - 12:00 PM Room E (G416+417)

Chair: Kenji Ishikawa

10:40 AM - 11:00 AM

[H2-O8-05 (Symposium Invited)] Development of New Oxynitride Semiconductors with Tunable Band Gaps Using Magnetron Sputtering

*Naho Itagaki1 (1. Kyushu Univ. (Japan))

Keywords:Magnetron sputtering, Ar/N2 plasma, Oxynitride semiconductors, ZnO, InN, AlN

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