[H2-O8] Slot 08

[H2-O8-07] Conductive carbon film deposition by microwave plasma with high voltage biasing

Ikumi Hamaguchi¹, *Hansin Bae¹, Kensuke Sasai², Haruka Suzuki^1,2, Hirotaka Toyoda^1,2,3 (1. Department of Electronics, Nagoya Univ. (Japan), 2. cLPS, Nagoya Univ. (Japan), 3. National Institute for Fusion Science (Japan))

キーワード：conductive carbon, surface-wave plasma, high-voltage bias, large-area deposition, high deposition rate