Materials Research Meeting 2021

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Poster Session

H. Innovative Materials Processing for Sustainable Society » [H-2] Plasma-Based Synthesis, Processing and Characterization of Materials for Energy and Environment

[H2-PR18] Slot 18

Thu. Dec 16, 2021 6:30 PM - 8:30 PM H2-PR18 (G403-404)

6:30 PM - 8:30 PM

[H2-PR18-27] AlN Thin Film Properties Improved by Pressure Gradient Sputtering

*Ken Yonezawa1, Tatsuyuki Nakatani2, Jun Seok Oh 3, Kazunori Koga4, Masaharu Shiratani4 (1. Kenix Corp. (Japan), 2. Okayama Univ. of Sci. (Japan), 3. Osaka City Univ. (Japan), 4. Kyusyu Univ. (Japan))

Keywords:Sputtering, AlN, Pressure Gradient Sputtering, PGS, Thin Film

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