[H2-PV23] Slot 23

[H2-PV23-05] Developing Prediction of Key Process Parameters of Plasma CVD for Fabricating a-Si:H Solar Cells through Boosting Technique

*Feiyu Chen¹, Kunihiro Kamataki¹, Yang Tao¹, Sakyo Okunaga¹, Daisuke Yamashita¹, Takamasa Okumura¹, Naho Itagaki¹, Kazunori Koga^1,2, Masaharu Shiratani¹ (1. Kyushu University (Japan), 2. NINS (Japan))