Structural analysis of carbon nanoparticle composite films prepared by Ar+CH<sub>4</sub> multi-hollow plasma chemical vapor deposition

Sung-Hwa Hwang

講演情報

Poster Session

H. Innovative Materials Processing for Sustainable Society » [H-2] Plasma-Based Synthesis, Processing and Characterization of Materials for Energy and Environment

[H2-PV23] Slot 23

2021年12月14日(火) 18:30 〜 20:00 H2-PV23 (online)

18:30 〜 20:00

[H2-PV23-06] Structural analysis of carbon nanoparticle composite films prepared by Ar+CH₄ multi-hollow plasma chemical vapor deposition

*Sung-Hwa Hwang¹, Shinjiro Ono¹, Takamasa Okumura¹, Kunihiro Kamataki¹, Naho Itagaki¹, Kazunori Koga^1,2, Tatsuyuki Nakatani³, Masaharu Shiratani¹ (1. Kyushu Univ. (Japan), 2. Nat'l Inst. of Nat. Sci. (Japan), 3. Okayama Univ. (Japan))

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講演情報

[H2-PV23] Slot 23

[H2-PV23-06] Structural analysis of carbon nanoparticle composite films prepared by Ar+CH4 multi-hollow plasma chemical vapor deposition

[H2-PV23-06] Structural analysis of carbon nanoparticle composite films prepared by Ar+CH₄ multi-hollow plasma chemical vapor deposition