Effect of rf bias on the film property of amorphous silicon oxide films deposited by plasma enhanced chemical vapor deposition

Akihiro Yamamoto

18:30 〜 20:00

[H2-PV23-26] Effect of rf bias on the film property of amorphous silicon oxide films deposited by plasma enhanced chemical vapor deposition

*Akihiro Yamamoto¹, Kohei Abe¹, Iori Nagao¹, Michihiro Otaka¹, Daisuke Yamashita¹, Kunishiro Kamataki¹, Takamasa Okumura¹, Naho Itagaki¹, Kazunori Koga^1,2, Masaharu Shiratani¹ (1. Kyushu Univ. Info. sci. and Electrical Engineering (Japan), 2. National Inst. of Natural Sci. (Japan))

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講演情報

[H2-PV23] Slot 23

[H2-PV23-26] Effect of rf bias on the film property of amorphous silicon oxide films deposited by plasma enhanced chemical vapor deposition