4:30 PM - 5:00 PM
*Shinjae You1, Sijun Kim1, Chulhee Cho1, Daewoong Kim2 (1. Chungnam National Univ. (Korea), 2. Korea Inst. of Machinery and Materials (Korea))
Oral Session
G. Process » [G-1] Advanced Plasma Processing in the New Era
Thu. Dec 14, 2023 4:30 PM - 6:30 PM Session 13 (Room I)
Chair: R. Mohan Sankaran (University of Illinois Urbana-Champaign)
4:30 PM - 5:00 PM
*Shinjae You1, Sijun Kim1, Chulhee Cho1, Daewoong Kim2 (1. Chungnam National Univ. (Korea), 2. Korea Inst. of Machinery and Materials (Korea))
5:00 PM - 5:30 PM
Jeong-Hwan Oh1, Minseok Kim2, Yong Hee Lee1, Tae-Hee Kim3, *Sooseok Choi1 (1. Jeju National Univ. (Korea), 2. UC Riverside (United States of America), 3. Wonkwang Univ. (Korea))
5:30 PM - 5:45 PM
*Neelakandan Marath Santhosh1,2, Janez Zavašnik1,2, Uroš Cvelbar1,2 (1. Jožef Stefan Institute (Slovenia), 2. Jožef Stefan International postgraduate School (Slovenia))
5:45 PM - 6:00 PM
Yiran Wang1, *Manabu Tanaka1, Takayuki Watanabe1 (1. Kyushu Univ. (Japan))
6:00 PM - 6:15 PM
*Chayanaphat Chokradjaroen1, Jiangqi Niu1, Nagahiro Saito1 (1. Nagoya University (Japan))
6:15 PM - 6:30 PM
*Giichiro Uchida1, Kodai Masumoto1 (1. Meijo Univ. (Japan))
Abstract password authentication.
Password is required to view the abstract. Please enter a password to authenticate.
Scheduled to be released in early December
Please log in with your participant account.
» Participant Log In