[G1-P501-01] Laser Induced Fluorescent Observation of NH radicals in Dielectric Barrier Dischargefor Nitriding Treatment

*Saki Wakabayashi¹, Masato Ueda¹, Amane Takeda¹, Ryuta Ichiki¹, Kosuke Tachibana¹, Takashi Huruki¹, Seiji Kanazawa¹ (1. Oita Univ. (Japan))

[G1-P501-02] Tribological Properties of Nitrided Layer and Oxidized Spot Formed by Nitriding Treatment using Atmospheric-Pressure Plasma Jet

*Shoho Ando¹, Koki Koyanagi¹, Ryuta Ichiki¹, Takefumi Otsu¹, Takashi Furuki¹, Seiji Kanazawa¹ (1. Oita Univ. (Japan))

[G1-P501-03] Raman mapping of DLC films using the HF-HiPIMS method to investigate the sp² cluster model

*Hiroyuki Fukue¹, Tatsuyuki Nakatani¹, Tadayuki Okano², Masahide Kuroiwa², Shinsuke Kunitsugu³, Susumu Takabayashi⁴, Hiroki Oota⁵, Ken Yonezawa^5,1 (1. Okayama Univ. of Sci. (Japan), 2. Tokyo Electronics Co., Ltd. (Japan), 3. Ind. Technol. Cent. Okayama Pref. (Japan), 4. National Inst. Technol., Ariake College (Japan), 5. Kenix Corporation (Japan))

[G1-P501-04] Investigation of Corrosion Resistance of Mg Alloys Oxidized by
Atmospheric Pressure Plasma Jet

*Riku Kometani¹, Ryuta Ichiki¹, Tatsuyuki Nakatani², Masaki Sonoda³, Takashi Furuki¹, Seiji Kanazawa¹ (1. Oita Univ. (Japan), 2. Okayama Univ. of Science (Japan), 3. Oita Industrial Research Inst. (Japan))

[G1-P501-05] Microstructure and Magnetic Properties of FeCoNiCu_xPt_x High Entropy Alloy Films

*Boya Li¹, Weikai Luo¹, Takashi Harumoto¹ (1. Tokyo Inst. of Tech. (Japan))

[G1-P501-06] Clover-Flower-Like Carbon Produced by RF Magnetron Sputtering

*Yudai Tokito¹, Yuta Sasaki², Soichiro Koga², Masami Aono¹ (1. Electrical and Electronics Engineering Program, Graduate School of Sci. and Engineering, Kagoshima Univ. (Japan), 2. Electrical and Electronics Engineering Program, Faculty of Engineering, Kagoshima Univ. (Japan))

[G1-P501-07] Effects of Carbon Nanoparticle Interposed between Two Hydrogenated Amorphous Carbon Films on Surface Morphology of a-C:H Film

*Shinjiro Ono¹, Manato Eri¹, Takamasa Okumura¹, Kunihiro Kamataki¹, Naoto Yamashita¹, Naho Itagaki¹, Kazunori Koga¹, Masaharu Shiratani¹ (1. Kyushu Univ. (Japan))

[G1-P501-08] Degradation of dielectric film by low-temperature plasma exposure investigated using in-situ impedance spectroscopy method

*Keiichiro Urabe¹, Junki Morozumi¹, Koji Eriguchi¹ (1. Kyoto Univ. (Japan))

[G1-P501-09] Competition between oxidation and carbide formation on Si wafer surfaces using VHF-PECVD

*Yu-Ting Chow¹, Pei-Cheng Jiang², Chung-Tzu Chang¹, Cheng-Hsun-Tony Chang¹ (1. Department of electronic engineering, Minghsin University of Science and Technology (Taiwan), 2. Department of mechanical engineering, Minghsin University of Science and Technology (Taiwan))

[G1-P501-10] Investigation of the number of fitting bands for Raman spectroscopy in DLC films - using AC HV methane plasma CVD method as an example -

*Yuichi Imai^1,2, Hiroyuki Fukue², Kazuma Tanaka², Tatsuyuki Nakatani², Shinsuke Kunitsugu³, Susumu Takabayashi⁴ (1. STRAWB Inc. (Japan), 2. Okayama University of Science (Japan), 3. Ind. Technol. Cent. Okayama Pref. (Japan), 4. National Inst. Technol., Ariake College (Japan))

[G1-P501-11] Multi-Purpose Plasma Monitoring by Sensor Devices Connected with Wireless Communication

*Osamu Sakai¹, Yohei Sanami¹, Kota Hamano¹, Yuji Kasashima², Tatsuo Tabaru² (1. Univ. Shiga Pref. (Japan), 2. AIST (Japan))

[G1-P501-12] Analysis of Plasma Processes using Machine Learning and Quantum Computing

*Masaharu Shiratani¹, Kunihiro Kamataki¹ (1. Kyushu Univ. (Japan))

[G1-P501-13] Catalytic ability of Cu and Ni in methanation with plasma catalysis

*Susumu Toko¹, Takamasa Okumura², Kunihiro Kamataki², Kosuke Takenaka¹, Kazunori Koga², Masaharu Shiratani², Yuichi Setsuhara¹ (1. Osaka Univ. (Japan), 2. Kyushu Univ. (Japan))

[G1-P501-14] Surface Functionalization of Polytetrafluoroethylene using Atmospheric Pressure DBD Plasma of Nitrogen with Water-Ethanol Vapor

*Sukma Wahyu Fitriani¹, Masaharu Shiratani¹, Akimitsu Hatta² (1. Kyushu Univ. (Japan), 2. Kochi Univ. of Tech. (Japan))

Session information

[G1-P501] Poster 501