[B1-P303] Poster 303

[B1-P303-23] Cr_1−xMo_xSi₂ thin film deposition using multi-target co-sputtering method

*Takashi Aizawa¹, Takao Mori^1,2 (1. National Inst. for Materials Sci. (Japan), 2. Univ. of Tsukuba (Japan))

キーワード：Silicide, Thin films, Sputtering, Doping