Molecular Anchoring onto Silicone Membrane Surface via Hydrosilylation Reaction toward Highly Selective CO<sub>2</sub> Separation

Takeo Nakano

講演情報

Oral Session

C. Environment » [C-1] Negative carbon emissions and carbon utilization technologies for SDGs

[C1-O503] Oral 503

2023年12月15日(金) 16:30 〜 18:30 Session 6 (Room F)

Chair: Shin-ichiro Noro (Hokkaido Univ.), Hirokazu Kobayashi (Kyushu University)

16:45 〜 17:00

[C1-O503-02] Molecular Anchoring onto Silicone Membrane Surface via Hydrosilylation Reaction toward Highly Selective CO₂ Separation

*Takeo Nakano¹, Kosuke Taketsuna², Shigenori Fujikawa^2,3 (1. Fac. Sci., Shinshu Univ. (Japan), 2. Grad. Sch. of Eng., Kyushu Univ. (Japan), 3. WPI-I²CNER, Kyushu Univ. (Japan))

キーワード：Separation membrane, CO2 capture, Siloxane material, Surface modification, Hydrosilylation

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講演情報

[C1-O503] Oral 503

[C1-O503-02] Molecular Anchoring onto Silicone Membrane Surface via Hydrosilylation Reaction toward Highly Selective CO2 Separation

[C1-O503-02] Molecular Anchoring onto Silicone Membrane Surface via Hydrosilylation Reaction toward Highly Selective CO₂ Separation