[D-L204] Late Breaking News

[D-L204-04] Fabrication of SnO Thin Film by Sputtering in Low-Concentration Reducing H₂ Atmosphere

*Tsubasa Kobayashi¹, Takuma Kawaguchi¹, Kanta Kibishi¹, Shinya Aikawa¹ (1. Kogakuin University (Japan))

Keywords: Ar/H2 annealing, SnO2 ceramic target, reduction process, oxide semiconductor