Imaging Equivalent Oxide Thickness of Dielectric Oxide Films by Scanning Capacitance Microscopy

Mao-Nan Chang

Presentation information

Oral Session

D. Electronic » [D-1] Synthesis, Processing and Characterization of Nanoscale and Functional Oxide Films -7th E-MRS & MRS-J Bilateral Symposium

[D1-O202] Oral 202

Tue. Dec 12, 2023 2:00 PM - 4:05 PM Session 11 (Room B-2)

Chair: Nobuyuki Iwata (Nihon University), Hiroshi Funakubo (Tokyo Institute of Technology)

2:50 PM - 3:05 PM

[D1-O202-02] Imaging Equivalent Oxide Thickness of Dielectric Oxide Films by Scanning Capacitance Microscopy

*Mao-Nan Chang¹, Yu-Hsun Hsueh², Chun-Chieh Wang³, Hsin-Hsuan Wu⁴, Yi-Shan Wu⁵ (1. National Chung Hsing Univ. (Taiwan), 2. National Chung Hsing Univ. (Taiwan), 3. National Chung Hsing Univ. (Taiwan), 4. National Chung Hsing Univ. (Taiwan), 5. National Chung Hsing Univ. (Taiwan))

Keywords:SCM, EOT, dc-stress, interface

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