Oxygen Content Effect on the Laser Induced Damage Threshold for HfO2 and ZrO2 Films Grown by Pulsed Laser Deposition

Valentin Craciun

Presentation information

Oral Session

D. Electronic » [D-1] Synthesis, Processing and Characterization of Nanoscale and Functional Oxide Films -7th E-MRS & MRS-J Bilateral Symposium

[D1-O302] Oral 302

Wed. Dec 13, 2023 2:00 PM - 4:00 PM Session 11 (Room B-2)

Chair: Nobuyuki Iwata (Nihon University), Uwe Schroeder (Namlab)

3:00 PM - 3:15 PM

[D1-O302-03] Oxygen Content Effect on the Laser Induced Damage Threshold for HfO2 and ZrO2 Films Grown by Pulsed Laser Deposition

*Valentin Craciun^1,3, Radu Udrea^1,5, Gabriel Bleotu³, Alice Dumitru³, Petronela Garoi¹, Daniel Ursescu³, Doina Craciun¹, Maria Diana Mihai^4,2 (1. National Institute for Laser, Plasma and Radiation Physics (Romania), 2. Univ. Politehnica from Bucharest (Romania), 3. Extreme Light Infrastructure for Nuclear Physics (Romania), 4. National Instute for Nuclear Physics and Engineering Horia Hulubei (Romania), 5. University of Bucharest (Romania))

Keywords:HfO2, ZrO2, thin film, laser induced damage threshold

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