[D1-O302] Oral 302

[D1-O302-03] Oxygen Content Effect on the Laser Induced Damage Threshold for HfO2 and ZrO2 Films Grown by Pulsed Laser Deposition

*Valentin Craciun^1,3, Radu Udrea^1,5, Gabriel Bleotu³, Alice Dumitru³, Petronela Garoi¹, Daniel Ursescu³, Doina Craciun¹, Maria Diana Mihai^4,2 (1. National Institute for Laser, Plasma and Radiation Physics (Romania), 2. Univ. Politehnica from Bucharest (Romania), 3. Extreme Light Infrastructure for Nuclear Physics (Romania), 4. National Instute for Nuclear Physics and Engineering Horia Hulubei (Romania), 5. University of Bucharest (Romania))

キーワード：HfO2, ZrO2, thin film, laser induced damage threshold