Synchrotron Soft X-ray Scanning Photoelectron Microscopy Analysis of Gate-controlled Photo-oxidation in Graphene Field-effect Transistors

Naoka NAGAMURA

講演情報

Oral Session

D. Electronic » [D-1] Synthesis, Processing and Characterization of Nanoscale and Functional Oxide Films -7th E-MRS & MRS-J Bilateral Symposium

[D1-O401] Oral 401

2023年12月14日(木) 09:00 〜 12:00 Session 11 (Room B-2)

Chair: Yasunobu Ando (National Institute of Advanced Industrial Science and Technology), Koji Horiba (National Institutes for Quantum Science and Technology)

10:30 〜 10:45

[D1-O401-05] Synchrotron Soft X-ray Scanning Photoelectron Microscopy Analysis of Gate-controlled Photo-oxidation in Graphene Field-effect Transistors

*Naoka NAGAMURA^1,2,3, Shun KONNO², Morihiro MATSUMOTO⁴, Wenxiong ZHANG⁵, Masato KOTSUGI², Masaharu OSHIMA⁵, Koji HORIBA⁶, Ryo NOUCHI^3,4 (1. NIMS (Japan), 2. Tokyo Univ. of Sci. (Japan), 3. PRESTO, JST (Japan), 4. Osaka Metropolitan Univ. (Japan), 5. The Univ. of Tokyo (Japan), 6. QST (Japan))

キーワード：Advanced characterization, Graphene, Photo-oxidation, Synchrotron Radiation, Microscopy

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