Stress and electrical resistivity evolution in sputtered ITO thin films

Jianhui Liang

Presentation information

Oral Session

D. Electronic » [D-1] Synthesis, Processing and Characterization of Nanoscale and Functional Oxide Films -7th E-MRS & MRS-J Bilateral Symposium

[D1-O403] Oral 403

Thu. Dec 14, 2023 4:30 PM - 6:30 PM Session 11 (Room B-2)

Chair: Katsuhisa Tanaka (Kyoto University), Andreas Klein (Technical University of Darmstadt)

6:00 PM - 6:15 PM

[D1-O403-06] Stress and electrical resistivity evolution in sputtered ITO thin films

*Jianhui Liang¹, Jiali Zhang¹, Walt Johnson¹, Kurt Rubin¹, Jeff Reichert¹, Lia McArthur¹, Oskar Amster¹, Rémy Juttin², Blaise Cuénod² (1. KLA Corporation (United States of America), 2. EPFL (Switzerland))

Keywords:indium tin oxide, stress, sheet resistance, electrical resistivity, grain boundary

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