Microscopic XPS and ARPES Measurements of Oxide Semiconductors Using A Wide-Angle Drivable and High-Precision Positioning Sample Goniometer

Kenichi Ozawa

Presentation information

Poster Session

D. Electronic » [D-1] Synthesis, Processing and Characterization of Nanoscale and Functional Oxide Films -7th E-MRS & MRS-J Bilateral Symposium

[D1-P304] Poster 304

Wed. Dec 13, 2023 6:30 PM - 8:30 PM Poster (Annex)

[D1-P304-19] Microscopic XPS and ARPES Measurements of Oxide Semiconductors Using A Wide-Angle Drivable and High-Precision Positioning Sample Goniometer

*Kenichi Ozawa^1,2, Yoshihiro Aiura³, Makoto Minohara³, Keita Hiromori⁴, Ayame Shimomura⁴, Nobuo Nakajima⁴, Kazuhiko Mase^1,2 (1. High Energy Accel. Res. Org. (KEK) (Japan), 2. SOKENDAI (Japan), 3. Natl. Inst. Adv. Indus. Sci. Tech. (AIST) (Japan), 4. Hiroshima Univ. (Japan))

Keywords:Micro-XPS, Micro-ARPES, Sample Goniometer, High-Precision Manipulation

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