[D1-P304] Poster 304

[D1-P304-19] Microscopic XPS and ARPES Measurements of Oxide Semiconductors Using A Wide-Angle Drivable and High-Precision Positioning Sample Goniometer

*Kenichi Ozawa^1,2, Yoshihiro Aiura³, Makoto Minohara³, Keita Hiromori⁴, Ayame Shimomura⁴, Nobuo Nakajima⁴, Kazuhiko Mase^1,2 (1. High Energy Accel. Res. Org. (KEK) (Japan), 2. SOKENDAI (Japan), 3. Natl. Inst. Adv. Indus. Sci. Tech. (AIST) (Japan), 4. Hiroshima Univ. (Japan))

キーワード：Micro-XPS, Micro-ARPES, Sample Goniometer, High-Precision Manipulation