[D4-O301] Oral 301

[D4-O301-05] Gate-Defined Josephson Weak-links in Monolayer WTe₂

*Michael Daniel Randle¹, Masayuki Hosoda², Russell S. Deacon^1,3, Manabu Ohtomo², Patrick Zellekens^1,3, Kenji Watanabe⁴, Takashi Taniguchi⁵, Shota Okazaki⁶, Takao Sasagawa⁶, Kenichi Kawaguchi², Shintaro Sato², Koji Ishibashi^1,3 (1. Advanced Device Laboratory, RIKEN (Japan), 2. Fujitsu Research, Fujitsu Ltd. (Japan), 3. RIKEN Center for Emergent Matter Science (CEMS) (Japan), 4. Research Center for Functional Materials NIMS (Japan), 5. International Center for Materials Nanoarchitectronics NIMS (Japan), 6. Laboratory for Materials and Structures TIT (Japan))

キーワード：Tungsten Ditelluride, Josephson junction, Topological insulators, Weak-link, Quantum spin hall insulator