High-rate Reactive and Stable Sputter Coatings for Y<sub>2</sub>O<sub>3</sub>

Presentation information

Oral Session

F. Functional & Structural » [F-3] Reliable Ceramics and Composites

Wed. Dec 13, 2023 10:00 AM - 12:00 PM Session 16 (Room 501)

Chair: Katsumi Yoshida (Tokyo Institute of Technology)

10:55 AM - 11:15 AM

*GunHwan Lee¹, WookHee Nam¹ (1. Korea Inst. of Materials Sci. (Korea))

Keywords:Plasma Resistant Coating, Reactive Sputtering, Plasma Control, High Rate Coating

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