MRM2023/IUMRS-ICA2023

Presentation information

Poster Session

G. Process » [G-1] Advanced Plasma Processing in the New Era

[G1-P501] Poster 501

Fri. Dec 15, 2023 10:00 AM - 12:00 PM Poster (Annex)

[G1-P501-09] Competition between oxidation and carbide formation on Si wafer surfaces using VHF-PECVD

*Yu-Ting Chow1, Pei-Cheng Jiang2, Chung-Tzu Chang1, Cheng-Hsun-Tony Chang1 (1. Department of electronic engineering, Minghsin University of Science and Technology (Taiwan), 2. Department of mechanical engineering, Minghsin University of Science and Technology (Taiwan))

Keywords:vhf-PECVD, SiO2, DLC, field emission

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