[G4-P401] Poster 401

[G4-P401-17] Vapor-phase chemical etching of silicon assisted by thin MoS₂ crystals

*Kaichi Yamamoto¹, Toru Utsunomiya¹, Takashi Ichii¹, Hiroyuki Sugimura¹ (1. Kyoto Univ. (Japan))

キーワード：silicon, MoS2, etching