MRM2023/IUMRS-ICA2023

講演情報

印刷

Oral Session

S. Co-Sponsored Topics » [S-2] 9th International Symposium on Transparent Conductive Materials & 13th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics (TCM-TOEO 2023)

[S2-O402] Oral 402

2023年12月14日(木) 14:00 〜 16:00 Session 1 (Room C-1)

Chair: Andreas Klein (Technical University of Darmstadt), Rui-Tao Wen (1)Southern University of Science and Technology, Dept. Materials Science & Engineering, Shenzhen, China)

15:30 〜 15:45

[S2-O402-05] Passivation performance of silicon oxynitride thin films via reactive sputtering for SAW duplexer

*Yeongha Song1, Seohan Kim2, Jung Chul Lee3, Taek Joo Lee3, Pungkeun Song1 (1. Dept. of Materials Sci. and Eng., Pusan National Univ. (Korea), 2. Inst. of Materials Tech., Pusan National Univ. (Korea), 3. Tech. Res. Inst., SAWNICS Inc. (Korea))

キーワード：Silicon oxynitride, passivation layer, SAW device, Reactive magnetron sputtering

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