[S2-P304] Poster 304

[S2-P304-08] Structural and optical properties of niobium oxide films deposited by the specially designed reactive sputtering system.

*Yuzo Shigesato¹, Mai Saito¹, Junjun Jia², Daniel Gloess³ (1. Aoyama Gakuin University (Japan), 2. Waseda University (Japan), 3. Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik (Germany))

キーワード：niobium oxide, reactive sputtering, plasma emission monitoring system, transition region, optical bandgap