[G1-P501] Poster 501

[G1-P501-08] Degradation of dielectric film by low-temperature plasma exposure investigated using in-situ impedance spectroscopy method

*Keiichiro Urabe¹, Junki Morozumi¹, Koji Eriguchi¹ (1. Kyoto Univ. (Japan))

キーワード：Plasma-material interaction, Impedance spectroscopy, Dielectric film property