4:00 PM - 5:30 PM
[TuP4-D4] Wafer-scale Grating Mapping System for Rapid Pitch and Diffraction Efficiency Measurement
Keywords:Semiconductor lasers, Optical diffractometer, Laser interference lithography
We demonstrate a wafer-scale grating mapping system for pitch and diffraction efficiency measurement with a speed of 0.6 second/point and a pitch resolution of 0.01 nm, enabling rapid monitoring of the grating uniformity.
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