[TuP4-D] Poster Session 1

[TuP4-D4] Wafer-scale Grating Mapping System for Rapid Pitch and Diffraction Efficiency Measurement

〇Zon-Ru Wu¹, Tzu-Chieh Kao¹, Chia-Wei Kao¹, Ping-Chien Chang^1,2, Wei Lin², Yung-Jr Hung¹ (¹National Sun Yat-sen Univ., Taiwan, ²LandMark Optoelectronics Corporation, Taiwan)

キーワード：Semiconductor lasers, Optical diffractometer, Laser interference lithography

We demonstrate a wafer-scale grating mapping system for pitch and diffraction efficiency measurement with a speed of 0.6 second/point and a pitch resolution of 0.01 nm, enabling rapid monitoring of the grating uniformity.