Oral Session 8

[LEDIA-8-05] Preparation of high-quality thick AlN layer on nano-patterned sapphire substrates with sputter-deposited annealed AlN film by hydride vapor-phase epitaxy

*Shiyu Xiao¹, Nan Jiang², Kanako Shojiki², Kenjiro Uesugi³, Hideto Miyake^1,2 (1. Graduate School of Regional Innovation Studies, Mie University, 2. Graduate School of Engineering, Mie University, 3. Organization for Promotion of Regional Innovation)