Short Oral Session

[LEDIA-P-05] Pulsed DC Sputtering Deposition of GaN Thin Films with Single Crystal Target for Low Impurity Concentration

*Shogo Imai¹, Yuna Onishi¹, Takuya Onodera¹, Masayuki Imanishi¹, Yusuke Mori¹, Hitoshi Miura², Nobuaki Takahashi², Yoshio Honda³, Heajeong Cheong³, Hiroshi Amano³, Masahiro Uemukai¹, Ryuji Katayama¹ (1. Graduate School of Engineering, Osaka University, 2. Tokyo Electron Technology Solutions Ltd., 3. Institute of Materials, Nagoya University)