*Yanqing Zheng¹, Xiaoniu Tu¹, Kainan Xiong¹, Sheng Wang¹, Erwei Shi¹, Jingui Ma², Liejia Qian² (1. Shanghai Institute of Ceramics Chinese Academy of Sciences, China, 2. Key Laboratory for Laser Plasmas, Ministry of Education , Shanghai Jiaotong University, Shanghai, China)

*Yasunori Tanaka¹, Ryota Murai², Yoshinori Takahashi², Tsuyoshi Sugita³, Daisetsu Toh¹, Kazuto Yamauchi¹, Sora Aikawa⁴, Yuji Umeda⁴, Yusuke Funamoto⁴, Tomosumi Kamimura⁴, Masayuki Imanishi¹, Yusuke Mori^1,5, Masashi Yoshimura^2,5 (1. Grad. Sch. of Eng., Osaka Univ., 2. ILE, Osaka Univ., 3. Nikon Corp., 4. Dept. of Electronics, Info. and Comm. Eng., Osaka Inst. Tech., 5. SOSHO CHOKO Inc.)

*Kuniaki Atagi¹, Ryota Murai², Yoshinori Takahashi², Yosuke Orii³, George Okada³, Masayuki Imanishi¹, Yusuke Mori¹, Masashi Yoshimura² (1. Graduate School of Engineering, Osaka University, 2. Institute of Laser Engineering, Osaka University, 3. Spectronix Corporation)