スケジュール 0 15:30 〜 16:00 [ALPS10-01(Invited)] 272 nm deep-ultraviolet laser diode fabricated on high-quality AlN substrate *Chiaki Sasaoka1, Ziyi Zhang1,2, Maki Kushimoto1, Tadayoshi Sakai1, Naoharu Sugiyama1, Leo John Schowalter1,3, Hiroshi Amano1 (1. Nagoya University, 2. Asahi Kasei Corporation, 3. Crystal IS)