Novel optical materials/structure and applications 2

[ALPS2-03] High-power 355 nm UV generation by using CsLiB₆O₁₀ crystal

*Kuniaki Atagi¹, Ryota Murai², Yoshinori Takahashi², Yosuke Orii³, George Okada³, Masayuki Imanishi¹, Yusuke Mori¹, Masashi Yoshimura² (1. Graduate School of Engineering, Osaka University, 2. Institute of Laser Engineering, Osaka University, 3. Spectronix Corporation)