Short wavelength light sources and applications (3)

[ALPS29-01] Ultrafast laser-driven extreme-ultraviolet sources for applications to advanced nanolithography

*THANH HUNG DINH¹, Shinichi Namba², Hiroki Yamamoto¹, Noboru Hasegawa¹, Masahiko Ishino¹, Masaharu Nishikino¹ (1. National Institutes for Quantum Science and Technology (QST), 2. Graduate School of Advanced Science and Engineering, Hiroshima University)

We develop ultrafast laser-driven EUV sources and attempt to evaluate the response of photoresist materials exposed to intense ultrashort EUV pulses, as a touchstone for the next-generation EUV-FEL lithography