Short wavelength light sources and applications (3)

[ALPS29-03(Invited)] Modelling of laser-driven EUV source plasmas for nanolithography

*John Sheil^1,2, Jorge Gonzalez^1,2, Stan de Lange^1,2, Oscar Versolato^1,2 (1. Advanced Research Center for Nanolithography (ARCNL), 2. Vrije Universiteit Amsterdam)

I will review our recent efforts in modeling laser-driven tin plasmas, specifically the atomic physics of EUV generation, radiation-hydrodynamic simulations of these plasmas as well as plasma expansion characterization.