XOPT Poster Session

[XOPTp-02] Fabrication of X-ray absorption gratings with 9 µm period by centrifugal deposition

*Ren Nasukawa¹, Yui Bishago¹, Kentaro Kajiwara³, Xiaoyu Liang^1,2, Wataru Yashiro^1,2,4,5 (1. Tohoku University, 2. IMRAM, 3. JASRI, 4. SRIS, 5. The University of Tokyo)

A challenge in X-ray grating interferometer is to fabricate high-aspect-ratio absorption X-ray gratings. While gold electro plating is commonly used to fill trenches of gratings, centrifugal deposition may be viable alternative as low-cost and high-throughput method. In this study, we fabricated an absorption grating with 9 µm period and 54 µm trench depth by centrifugal deposition and achieved visibility of 25.6 % in Talbot interferometry.