XOPT Poster Session

[XOPTp-17] High-pressure plasma etching for a finish processing of a micro channel-cut crystal monochromator

*Masafumi Miyake¹, Shotaro Matsumura¹, Iori Ogasahara¹, Taito Osaka², Kazuto Yamauchi¹, Makina Yabashi^2,3, Yasuhisa Sano¹ (1. Osaka University, 2. RIKEN/SPring-8, 3. JASRI)

We proposed the high-pressure plasma etching method to fabricate a micro channel-cut crystal monochromator for reflection self-seeding XFEL. In this presentation, we will talk its processing characteristics.