Poster Session 2

[2P73] Improve Charge Transfer under Strong Coupling Conditions via Interfacial Modulation

*En Cao¹, Xu Shi², Yocefu Hattori¹, Quan Sun¹, Tomoya Oshikiri³, Hiroaki Misawa^1,4 (1. Research Institute for Electronic Science, Hokkaido University, 2. Creative Research Institution, Hokkaido University, 3. Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 4. National Yangming Jiaotong University)

Keywords:Localized surface plasmon, Interfacial modification, Charge transfer