Effect of Ar/O<sub>2</sub> Gas Flow Blown to a Linear Thermal Plasma Generated on Si Substrate in 2D Rapid Oxidation using Loop Type of Inductively Coupled Thermal Plasmas

Takumi Tsuchiya

9:30 AM - 9:50 AM

[23Ea-02] Effect of Ar/O₂ Gas Flow Blown to a Linear Thermal Plasma Generated on Si Substrate in 2D Rapid Oxidation using Loop Type of Inductively Coupled Thermal Plasmas

*Takumi Tsuchiya¹, Atsushi Fujita¹, Yasunori Tanaka¹, Yoshihiko Uesugi¹, Tatsuo Ishijima¹, Tetsuya Yukimoto², Hiroshi Kawaura² (1. Univ. of Kanazawa, 2. CVR)

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Presentation information

[23Ea] Session 16

[23Ea-02] Effect of Ar/O₂ Gas Flow Blown to a Linear Thermal Plasma Generated on Si Substrate in 2D Rapid Oxidation using Loop Type of Inductively Coupled Thermal Plasmas

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Presentation information

[23Ea] Session 16

[23Ea-02] Effect of Ar/O2 Gas Flow Blown to a Linear Thermal Plasma Generated on Si Substrate in 2D Rapid Oxidation using Loop Type of Inductively Coupled Thermal Plasmas

Password

[23Ea-02] Effect of Ar/O₂ Gas Flow Blown to a Linear Thermal Plasma Generated on Si Substrate in 2D Rapid Oxidation using Loop Type of Inductively Coupled Thermal Plasmas