Plasma Conference 2017

Presentation information

Poster Presentation

[24P] Poster 4

Fri. Nov 24, 2017 2:00 PM - 4:00 PM Poster (1F Exhibition Hall)

2:00 PM - 4:00 PM

[24P-45] The Influence of Bias Voltage on Substrate Current Density of DLC Films by High-Power Impulse Magnetron Sputtering Method

*Hiroyuki Fukue1, Tatsuyuki Nakatani1, Tadayuki Okano2, Masahide Kuroiwa2 (1. Okayama Univ. of Sci., 2. TOEL)

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