[Session 5] Interface and Reliability/Variability

[Session_5-04] Theoretical Limit of TiSi2 Contact Resistance

*Min Yong Jeong¹, Mohammad Ali Pourghaderi¹, Kantawong Vuttivorakulchai¹, Seunghyun Song¹, Yoon-Suk Kim¹, Márton Vörös², Seonghoon Jin², Byounghak Lee², Woosung Choi², Uihui Kwon¹, Dae Sin Kim¹ (1. Samsung Electronics Co., Ltd., 2. Device Laboratory Samsung Semiconductor Inc.)