Green Laser Crystallized Poly-Si Thin-film Transistor and CMOS Inverter using HfO<sub>2</sub>-ZrO<sub>2</sub> Superlattice Gate Insulator  and Microwave Annealing for BEOL Applications

Chih-Hsiang Chang

Presentation information

Oral Session

Si Nanoelectronics & Device Physics

[5] Advanced CMOS Technology

Sun. Jun 11, 2023 2:30 PM - 4:30 PM Shunjyu I (Shunjyu I)

Chair:Masaharu Kobayashi(Univ. of Tokyo), Peide Ye(Purdue Univ)

3:50 PM - 4:10 PM

[5-05] Green Laser Crystallized Poly-Si Thin-film Transistor and CMOS Inverter using HfO₂-ZrO₂ Superlattice Gate Insulator and Microwave Annealing for BEOL Applications

*Chih-Hsiang Chang¹, Siao-Cheng Yan¹, Chong-Jhe Sun¹, Ming-Yueh Huang¹, Bo-An Chen¹, Xin-Chan Zhong¹, Yi-Wen Lin¹, Yung-Chun Wu¹ (1. National Tsing Hua Univ. (Taiwan))

Abstract password authentication.
Password is required to view the abstract. Please enter a password to authenticate.

Presentation information

[5] Advanced CMOS Technology

[5-05] Green Laser Crystallized Poly-Si Thin-film Transistor and CMOS Inverter using HfO2-ZrO2 Superlattice Gate Insulator and Microwave Annealing for BEOL Applications

Password

[5-05] Green Laser Crystallized Poly-Si Thin-film Transistor and CMOS Inverter using HfO₂-ZrO₂ Superlattice Gate Insulator and Microwave Annealing for BEOL Applications