The Japan Society of Applied Physics

2:30 PM - 2:50 PM

[K-4-02] CMOS Integration of Thermally Stable Diffusion and Gate Replacement (D&GR) High-k/Metal Gate Stacks in DRAM Periphery Transistors

E. Dentoni Litta1, R. Ritzenthaler1, T. Schram1, A. Spessot1, B. O'Sullivan1, Y. Ji2, G. Mannaert1, C. Lorant1, F. Sebaai1, A. Thiam1, M. Ercken1, S. Demuynck1, N. Horiguchi1 (1.IMEC (Belgium), 2.SK Hynix (Korea))

https://doi.org/10.7567/SSDM.2017.K-4-02